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Lawrence Livermore has joined forces with Sandia/California and Lawrence Berkeley national laboratories to research and develop extreme ultraviolet lithography (EUVL) for use in the semiconductor industry. Lithography is the critical technology that enables computer microchip manufacturers to place more and more features on each chip, thus increasing computer power while shrinking computer size. With current lithography techniques pushed about as far as they can go, semiconductor industries must soon decide on a standard lithography technology for producing the next generation of computer microchips. EUVL uses extreme ultraviolet light to produce microchip circuit lines smaller than 100 nanometers in width. The three laboratories are integrating the needed technologies into an engineering test stand to demonstrate how EUVL can meet industry requirements. Lawrence Livermore is leading efforts to develop the optical systems and components, thin films, masks, and submicrometer metrology needed to bring this technology into everyday use in the semiconductor industry of the future.
Lawrence Livermore's Center for Microtechnology has been a leader in the design and fabrication of micro-electromechanical systems (MEMS) for several years. Current work in integrated microfluidic systems is a relatively new avenue for MEMS research. These systems will handle the air and fluid samples that are taken to identify biological or chemical warfare agents or to identify the cells that cause disease. (In other work at Livermore, detectors are being developed that identify the specific pathogen or disease present in the sample.) Devices small enough to fit on a microchip of silicon, glass, or plastic will take in samples; mix them with reagents; separate out DNA, cells, or other agents in the sample; and sense the presence of those agents.
and LLNL Disclaimers